Notice: Only variables should be assigned by reference in /web/stoner/modules/mod_s5_image_and_content_fader/mod_s5_image_and_content_fader.php on line 13
XPS Microscope
- Scanning x-ray source - Sample introduction chamber - Argon sputter ion gun - Electron energy analyzer - Optical microscope - Five axis automated sample manipulator - Optional UHV sample preparation chambers - Optional C60 sputter ion gun - Optional UV light source for UPS - Optional dual anode x-ray source - Optional electron gun for AES
Technical specifications: - High speed and high precision vertical goniometer for various application - Independent dual axis θ-2θ linkage drive, independent 2θ axis and θ axis drives are selectable - High-precision angle reproducibility ( 0.0010 ) - Rotational sample stage - Powder and bulk samples measurements between 1.50 -1650 on 2θ - Thin films samples measurements by grazing incidence method (grazing incidence angle between 0.5-50)
Applications: - Qualitative analysis: identification of crystalline phases - Precise quantitative analysis by Rietveld method (Fundamental Parameters Approach) - Crystallite size/lattice microstrain calculation - Degree of crystallinity calculation and determination of amorphous content - Overlapping peak separation
